I. Basic Information

Brand: Applied Materials (AMAT, Applied Materials)

Lot Number: 0010-00298

Alias: RF Micro-Match, RF Match Assembly, 8300 RF Matching Module

Type: 13.56 MHz RF Impedance Matching Network (Core Component of Plasma Process)

Compatible Models (Key Points)

Main Machine: AMAT 8300 Etching Machine (Standard Configuration)

Centura Series: DPS / DPS+ Metal Etching, Polycrystalline Etching Chambers

RF Power Supply: Compatible with 13.56 MHz RF Generator (e.g., ENI, MKS, Advanced Energy, etc.)

Core Specifications (Simplified)

Working Frequency: 13.56 MHz

Impedance Standard: 50 Ω

Power Range: ≤ 1000 W (Continuous)

Tuning Method: Built-in Variable Capacitor / Inductor, Automatic / Manual Tuning

Interfaces: RF Input (SMA), Chamber Output, DC Bias Interface

Function: Matches dynamic plasma load to 50 Ω, reduces reflected power, stabilizes plasma, and improves power transmission efficiency

Common Failures and Phenomena

High Reflection: Reflection Power > 5%, RF Alarm, Process Instability

Difficulty in Arcing: Chamber Difficulty Ignition, Plasma Flashes, Abnormal Bias

Hardware Damage: Internal Capacitor / Inductor Burnout, Oxidation of Connectors, PCB Burn Marks

Operating Environment: Vacuum / Atmosphere, Clean Room, Long-term RF Radiation