Basic Information

Brand: Applied Materials (AMAT)

Model: 0010-59799

Name: Heater Assembly

Suitable for Wafers: 300mm (12 inches)

Suitable for Equipment: AMAT Producer GT/SE platform, commonly used for CVD, dielectric layer deposition, and low-temperature process chambers

Key Parameters

Temperature Range: Room temperature to 480°C, normal process uses 80–380°C

Rated Power: Approximately 3.8kW, zone-controlled temperature design

Temperature Control Precision: ±0.6°C, surface temperature uniformity ≤ ±1.5°C

Structural Material: High-purity alumina ceramic working surface, internal heating wire + dual-path thermocouple, body alloy material, integrated water cooling, vacuum sealing, and electrical interface

Operating Environment: High vacuum chamber, compatible with conventional process gases and weak plasma environment

Core Functions

Carries 300mm wafers and provides stable heating, achieves temperature closed-loop control through thermocouples; water cooling structure ensures thermal stability and rapid cooling, meets the requirements of temperature consistency for film deposition processes, reduces inter-wafer process deviations.

Vulnerable Points & Maintenance

Common Issues: Ceramic surface contamination, scratches, micro-cracks; abnormal resistance of heating circuit; thermocouple drift; aging and leakage of sealing parts, vacuum leakage.

Maintenance Suggestions: Regularly clean the surface deposits; conduct temperature calibration annually; ｒｅｐｌａｃｅ the entire unit when there is ceramic surface damage, heating failure, water leakage, or gas leakage.